Equivalent to Fujimi FO 1500 Lapping Powder
| Item | Size | Specific Gravity | Al2O3 | SiO2 | Fe2O3 | TiO2 | ZrO2 |
| FO lapping powder | 1500# | ≥3.90 | ≥40.5% | ≤20.0% | ≤0.7% | ≤2.0% | ≤33.0% |
PSD(Particle Size Distribution) of Equivalent to Fujimi FO 1500 Lapping Powder
| Size | D0(um) | D3(um) | D50(um) | D94(um) |
| #1500 | ≤19.0 | ≤17.0 | 5.5±0.5 | ≥3.0 |
Equivalent to Fujimi FO Lapping Powder Main Applications
–Grinding and polishing of semiconductor wafers
–Surface finishing of various optical glasses
–Grinding and polishing of lenses, prisms, mirrors, filters, etc. of optical crystals.
–Surface finishing of piezoelectric materials
Packing of Equivalent to Fujimi FO Lapping Powder
10kgs pvc bags+pallet
