Equivalent to Fujimi FO 1000 Lapping Powder
Physical properties and Chemical composition of Equivalent to Fujimi FO 1000 Lapping Powder
| Item | Size | Specific Gravity | Al2O3 | SiO2 | Fe2O3 | TiO2 | ZrO2 |
| FO lapping powder | 1000# | ≥3.90 | ≥45.0% | ≤20.0% | ≤0.5% | ≤2.0% | ≤33.0% |
PSD(Particle Size Distribution) of Equivalent to Fujimi FO 1000 Lapping Powder
| Size | D0(um) | D3(um) | D50(um) | D94(um) |
| #1000 | ≤27.0 | ≤23.0 | 9.4±0.8 | ≥5.0 |
FO lapping powder Main Applications
–Grinding and polishing of semiconductor wafers
–Surface finishing of various optical glasses
–Grinding and polishing of lenses, prisms, mirrors, filters, etc. of optical crystals.
–Surface finishing of piezoelectric materials
Packing of FO lapping powder
10kgs pvc bags+pallet
